Crystallization of manganese cobalt nickelate films prepared by chemical deposition

  • Yujian Ge*
  • , Zhiming Huang
  • , Yun Hou
  • , Tianxin Li
  • , Junhao Chu
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Manganese cobalt nickelate films (MnxCoyNi 3-x-y)O4 (MCN) are successfully prepared by chemical deposition method at a crystallization temperature of 600°C, which is greatly reduced from the traditional sintered temperature of ~1050 - 1200°C. From the XRD and AFM, we find the grain size of the MCN films increases from 20 to 60 nm with the annealing temperature increase from 600°C to 900°C.

Original languageEnglish
Title of host publicationSixth International Conference on Thin Film Physics and Applications
DOIs
StatePublished - 2008
Externally publishedYes
Event6th International Conference on Thin Film Physics and Applications, TFPA 2007 - Shanghai, China
Duration: 25 Sep 200728 Sep 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6984
ISSN (Print)0277-786X

Conference

Conference6th International Conference on Thin Film Physics and Applications, TFPA 2007
Country/TerritoryChina
CityShanghai
Period25/09/0728/09/07

Keywords

  • Atomic force microscopy
  • Diffraction
  • Manganese cobalt nickelate film

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