TY - JOUR
T1 - Crystallization mechanism and lasing properties of CsPbBr3 perovskites by chemical vapor deposition
AU - Su, Zhan
AU - Cao, Zhenghao
AU - Cao, Fuyi
AU - He, Yawen
AU - Zhang, Jing
AU - Weng, Guoen
AU - Hu, Xiaobo
AU - Chu, Junhao
AU - Akiyama, Hidefumi
AU - Chen, Shaoqiang
N1 - Publisher Copyright:
© 2023
PY - 2023/9/15
Y1 - 2023/9/15
N2 - The chemical vapor deposition (CVD) technique is widely used in industry for growing perovskite materials with high crystalline quality and low defect density. However, the underlying crystallization mechanism of all-inorganic lead halide perovskites during the implementation of the CVD process has not been clearly revealed. Under this direction, in this work, hemispheric, rod-shaped, plate-shaped, triangular pyramid-shaped, and irregular-shaped, etc. cesium lead bromide (CsPbBr3) perovskite microcavities were obtained by adjusting the local temperature distribution, substrate types, deposition position, carrier gas flow rate (CGFR), and air pressure within the tube furnace. The crystallization mechanism for the CsPbBr3 microcavity growth with different shapes, densities, and sizes was investigated. It can be seen from the scanning electron microscope (SEM) images that micron hemispheres can be obtained at 5.5 to 6.5 cm (1 0 0) Si substrates at standard atmospheric pressure and high deposition temperatures. On the contrary, at low deposition temperatures, microrods, microplates, and microcuboids can be fabricated on the (1 1 1) Si, (1 0 0) Si, and indium tin oxide (ITO) substrates, respectively, without carrier gas flow and air pressure. We can also modulate the size of the micron hemispheres and microplates by altering the deposition position and CGFR. Moreover, the lasing characteristics of the microplate, microrod, and microcuboid were examined by photoluminescence (PL) and time-resolved PL (TRPL) measurements. Our work provided a feasible method to control the crystal sizes, cavity shapes, and optical properties for the development of various types of lead halide perovskites.
AB - The chemical vapor deposition (CVD) technique is widely used in industry for growing perovskite materials with high crystalline quality and low defect density. However, the underlying crystallization mechanism of all-inorganic lead halide perovskites during the implementation of the CVD process has not been clearly revealed. Under this direction, in this work, hemispheric, rod-shaped, plate-shaped, triangular pyramid-shaped, and irregular-shaped, etc. cesium lead bromide (CsPbBr3) perovskite microcavities were obtained by adjusting the local temperature distribution, substrate types, deposition position, carrier gas flow rate (CGFR), and air pressure within the tube furnace. The crystallization mechanism for the CsPbBr3 microcavity growth with different shapes, densities, and sizes was investigated. It can be seen from the scanning electron microscope (SEM) images that micron hemispheres can be obtained at 5.5 to 6.5 cm (1 0 0) Si substrates at standard atmospheric pressure and high deposition temperatures. On the contrary, at low deposition temperatures, microrods, microplates, and microcuboids can be fabricated on the (1 1 1) Si, (1 0 0) Si, and indium tin oxide (ITO) substrates, respectively, without carrier gas flow and air pressure. We can also modulate the size of the micron hemispheres and microplates by altering the deposition position and CGFR. Moreover, the lasing characteristics of the microplate, microrod, and microcuboid were examined by photoluminescence (PL) and time-resolved PL (TRPL) measurements. Our work provided a feasible method to control the crystal sizes, cavity shapes, and optical properties for the development of various types of lead halide perovskites.
KW - Cesium lead halide perovskites
KW - Chemical vapor deposition
KW - Crystallization mechanism
KW - Laser
KW - Microcavities
UR - https://www.scopus.com/pages/publications/85165691377
U2 - 10.1016/j.cej.2023.144906
DO - 10.1016/j.cej.2023.144906
M3 - 文章
AN - SCOPUS:85165691377
SN - 1385-8947
VL - 472
JO - Chemical Engineering Journal
JF - Chemical Engineering Journal
M1 - 144906
ER -