Controlling the sharpness of metal-insulator transition in epitaxial (La1-xPrx)0.67Ca0.33MnO3 (0 ≤ x ≤ 0.35) films

  • Pingfan Chen*
  • , Zhen Huang
  • , Xuelian Tan
  • , Binbin Chen
  • , Bowen Zhi
  • , Guanyin Gao
  • , Feng Chen
  • , Wenbin Wu
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

We report that epitaxial strain and chemical doping can be used cooperatively to tune the sharpness of metal-insulator transition (MIT) in epitaxial (La1-xPrx)0.67Ca0.33MnO3 (LPCMO) films. Compared to multiple MITs in anisotropically strained LPCMO/(LaAlO3)0.3(SrAl0.5Ta0.5O3)0.7(001)C (LSAT) films with a phase-separated ground state, the lattice-matched LPCMO/NdGaO3(110)Or (NGO) films show a sharp MIT near the Curie temperature (TC), with a ferromagnetic-metallic ground state. The sharpness of MIT, as evaluated by the temperature coefficient of resistance (TCR), can be two times larger in LPCMO/NGO films than in LPCMO/LSAT films. Moreover, for LPCMO/NGO films, TCR greatly relies on the Pr doping level x, where a maximum TCR value of 88.17% K-1 can be obtained at x=0.25, but shows less dependence on the film thicknesses. These results suggest that the combination of epitaxial strain and chemical doping could be employed to control not only the ground state of the manganite films, but the sharpness of MIT at various TC, providing the feasibility to design manganite-based infrared devices in a broad temperature range.

Original languageEnglish
Article number144502
JournalJournal of Applied Physics
Volume116
Issue number14
DOIs
StatePublished - 14 Oct 2014
Externally publishedYes

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