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Comparison of the crystallization of Ge-Sb-Te and Si-Sb-Te in a constant-temperature annealing process

  • Ting Zhang*
  • , Yan Cheng
  • , Zhitang Song
  • , Bo Liu
  • , Songlin Feng
  • , Xiaodong Han
  • , Ze Zhang
  • , Bomy Chen
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The crystallization of Ge-Sb-Te and Si-Sb-Te phase-change materials has been characterized by in situ time-dependent resistance measurement and transmission electron microscopy. Although silicon has various properties that are similar to those of germanium, Si-Sb-Te and Ge-Sb-Te crystallize via different processes. Si-Sb-Te has a complex structure (mainly hexagonal) while Ge-Sb-Te has a simple face-centered cubic structure when annealed at 433 K for several hours.

Original languageEnglish
Pages (from-to)977-980
Number of pages4
JournalScripta Materialia
Volume58
Issue number11
DOIs
StatePublished - Jun 2008
Externally publishedYes

Keywords

  • GeSbTe
  • Phase-change material
  • Phase-change memory
  • SiSbTe

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