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Compact Ultra-Low Loss Optical True Delay Line on Thin Film Lithium Niobate

  • Yuan Ren
  • , Bo Yang Nan
  • , Rong Bo Wu*
  • , Yong Zheng
  • , Rui Xue Liu
  • , Xue Wen Wang*
  • , Yun Peng Song
  • , Min Wang
  • , Ya Cheng*
  • *Corresponding author for this work
  • East China Normal University
  • Wuhan University of Technology
  • CAS - Shanghai Institute of Optics and Fine Mechanics
  • Shanxi University
  • Shandong Normal University
  • Shanghai Research Center for Quantum Sciences
  • Hefei National Laboratory

Research output: Contribution to journalArticlepeer-review

Abstract

We report the fabrication of an 8-meter-long thin-film lithium niobate optical true delay line using the photolithography-assisted chemomechanical etching technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.

Original languageEnglish
Article number070401
JournalChinese Physics Letters
Volume42
Issue number7
DOIs
StatePublished - 1 Jul 2025

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