Abstract
We report the fabrication of an 8-meter-long thin-film lithium niobate optical true delay line using the photolithography-assisted chemomechanical etching technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
| Original language | English |
|---|---|
| Article number | 070401 |
| Journal | Chinese Physics Letters |
| Volume | 42 |
| Issue number | 7 |
| DOIs | |
| State | Published - 1 Jul 2025 |
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