Characterizing leakage current in silicon nanowire-based field-effect transistors by applying pseudo-random sequences

Tomi Roinila, Xiao Yu, Anran Gao, Tie Li, Jarmo Verho, Matti Vilkko, Pasi Kallio, Yuelin Wang, Jukka Lekkala

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

Development of miniaturized devices that enable rapid and direct recognition of small molecules has become a growing research area in various fields of nanotechnology. Silicon nanowire-based field-effect transistors (SiNW FETs) have been experimentally demonstrated for direct, label free, highly selective, and real-time detection of biological and chemical targets at very low concentrations. The detection of a target is based on the variation of conductance of the nanowire channel which is seen in the voltage-current behavior between the drain and source. Some current, known as leakage current, flows between the gate and drain, and affects the current between the drain and source in noise-like manner. The current is extremely low at DC, and can be ignored in most cases. Recent studies suggest, however, that the leakage current is likely to exhibit frequency-dependent characteristics. Recognizing such properties can possibly take great advantage in developing new detection technologies utilizing SiNW FETs. This paper applies the maximum-length binary sequence (MLBS) and spectrum method, and presents fast frequency-domain methods which can be used to measure and characterize the leakage current. Experimental measurements are shown from an n-type SiNW FET. The results clearly indicate the existence of the mentioned frequency-dependent characteristics.

Original languageEnglish
Title of host publication2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012 - Conference Proceedings
Pages160-164
Number of pages5
DOIs
StatePublished - 2012
Externally publishedYes
Event2012 2nd International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012 - Xi'an, China
Duration: 29 Aug 20121 Sep 2012

Publication series

Name2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012 - Conference Proceedings

Conference

Conference2012 2nd International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012
Country/TerritoryChina
CityXi'an
Period29/08/121/09/12

Keywords

  • Excitation signal design
  • Field-effect transistor
  • Frequency response measurement
  • Leakage current
  • Silicon nanowire

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