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Characterization of FeSix film by codeposition on β-FeSi2 template

  • Xiangdong Chen*
  • , Lianwei Wang
  • , Qinwo Shen
  • , Rushan Ni
  • , Chenglu Lin
  • *Corresponding author for this work
  • CAS - Shanghai Institute of Microsystem and Information Technology

Research output: Contribution to journalArticlepeer-review

Abstract

We report the characterization of FeSix (x∼3) thin film prepared by simultaneous electron beam evaporation of Fe and Si onto a β-FeSi2 template at 250°C. The in situ reflective high energy electron diffraction observation and ex situ cross-section transmission electron microscope characterization of the as-deposited film imply that the as-deposited film has the structure similar to that of β-FeSi2. But the spreading resistance measurement shows that the film is metallic. Auger electron spectroscopy suggests that the chemical environment of Fe atoms in the as-deposited FeSix film is different from that in the annealed film (β-FeSi2 film). We explain this paradox by assuming that the as-deposited film has the crystal lattice similar to β-FeSi2 but with ingredient disorder due to the low transport viscosity of Fe and Si atoms at this temperature.

Original languageEnglish
Pages (from-to)2858-2860
Number of pages3
JournalApplied Physics Letters
Volume68
Issue number20
DOIs
StatePublished - 1996
Externally publishedYes

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