Abstract
We demonstrate a time-efficient and low-cost approach to fabricate Si 3 N 4 coated nanodome structures in fluorescent SiC. Nanosphere lithography is used as the nanopatterning method and SiC nanodome structures with Si 3 N 4 coating are formed via dry etching and thin film deposition process. By using this method, a significant broadband surface antireflection and a considerable omnidirectional luminescence enhancement are obtained. The experimental observations are then supported by numerical simulations. It is believed that our fabrication method will be well suitable for large-scale production in the future.
| Original language | English |
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| Article number | 4662 |
| Journal | Scientific Reports |
| Volume | 4 |
| DOIs | |
| State | Published - 11 Apr 2014 |
| Externally published | Yes |