| Original language | English |
|---|---|
| Pages (from-to) | 583-587 |
| Number of pages | 5 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 22 |
| Issue number | 2 |
| DOIs | |
| State | Published - 2004 |
| Externally published | Yes |
Band-gap expansion, core-level shift, and dielectric suppression of porous silicon passivated by plasma fluorination
- L. K. Pan*
- , Y. K. Ee
- , C. Q. Sun
- , G. Q. Yu
- , Q. Y. Zhang
- , B. K. Tay
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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