Band-gap expansion, core-level shift, and dielectric suppression of porous silicon passivated by plasma fluorination

  • L. K. Pan*
  • , Y. K. Ee
  • , C. Q. Sun
  • , G. Q. Yu
  • , Q. Y. Zhang
  • , B. K. Tay
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

31 Scopus citations
Original languageEnglish
Pages (from-to)583-587
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number2
DOIs
StatePublished - 2004
Externally publishedYes

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