Anode/organic interface modification by plasma polymerized fluorocarbon films

J. X. Tang; Y. Q. Li; L. R. Zheng; L. S. Hung

doi:10.1063/1.1667276

Anode/organic interface modification by plasma polymerized fluorocarbon films

J. X. Tang
, Y. Q. Li
, L. R. Zheng
, L. S. Hung^*

^*Corresponding author for this work

City University of Hong Kong

Research output: Contribution to journal › Article › peer-review

52 Scopus citations

Abstract

The effects of plasma polymerized fluorocarbon films (CF_x) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CF_x film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air.

Original language	English
Pages (from-to)	4397-4403
Number of pages	7
Journal	Journal of Applied Physics
Volume	95
Issue number	8
DOIs	https://doi.org/10.1063/1.1667276
State	Published - 15 Apr 2004
Externally published	Yes

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title = "Anode/organic interface modification by plasma polymerized fluorocarbon films",

abstract = "The effects of plasma polymerized fluorocarbon films (CFx) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CFx film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air.",

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AU - Li, Y. Q.

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AU - Hung, L. S.

PY - 2004/4/15

Y1 - 2004/4/15

N2 - The effects of plasma polymerized fluorocarbon films (CFx) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CFx film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air.

AB - The effects of plasma polymerized fluorocarbon films (CFx) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CFx film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air.

UR - https://www.scopus.com/pages/publications/2342582248

U2 - 10.1063/1.1667276

DO - 10.1063/1.1667276

M3 - 文章

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VL - 95

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EP - 4403

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8

ER -

Anode/organic interface modification by plasma polymerized fluorocarbon films

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