Annealing process and mechanism of glass based VO2 film from V oxidation in pure oxygen atmosphere

Xingxing Liu; Ruonan Ji; Yi Zhang; Huafen Li; Shao Wei Wang

doi:10.1007/s11082-016-0720-x

Annealing process and mechanism of glass based VO₂ film from V oxidation in pure oxygen atmosphere

Xingxing Liu, Ruonan Ji, Yi Zhang, Huafen Li, Shao Wei Wang

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Vanadium oxidation method is a promising approach for industrial production of VO₂ thin film on glass. For this method, post-annealing process is vital to the formation and quality of VO₂ thin film. Annealing temperature, time, and oxygen pressure for preparing of large scale VO₂ films on glass were studied systematically in this work. The influence of V film thickness is studied as well. The results reveal that the best annealing parameters are significantly influenced by the thickness of V film. The mechanism of annealing oxidation process is discussed further. The oxidation process is dominated by the reaction-control rather than the diffusion-control. A 200 mm × 200 mm large area VO₂ film on glass substrate was successfully prepared through metal vanadium oxidation method for demonstration. It is a promising way for large scale fabrication of high performance smart energy-saving window.

Original language	English
Article number	453
Journal	Optical and Quantum Electronics
Volume	48
Issue number	10
DOIs	https://doi.org/10.1007/s11082-016-0720-x
State	Published - 1 Oct 2016
Externally published	Yes

Keywords

Annealing
Magnetron sputtering
Transmission change
VO film

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10.1007/s11082-016-0720-x

Cite this

@article{8eea7c4efc914097a35b0e749427305f,

title = "Annealing process and mechanism of glass based VO2 film from V oxidation in pure oxygen atmosphere",

abstract = "Vanadium oxidation method is a promising approach for industrial production of VO2 thin film on glass. For this method, post-annealing process is vital to the formation and quality of VO2 thin film. Annealing temperature, time, and oxygen pressure for preparing of large scale VO2 films on glass were studied systematically in this work. The influence of V film thickness is studied as well. The results reveal that the best annealing parameters are significantly influenced by the thickness of V film. The mechanism of annealing oxidation process is discussed further. The oxidation process is dominated by the reaction-control rather than the diffusion-control. A 200 mm × 200 mm large area VO2 film on glass substrate was successfully prepared through metal vanadium oxidation method for demonstration. It is a promising way for large scale fabrication of high performance smart energy-saving window.",

keywords = "Annealing, Magnetron sputtering, Transmission change, VO film",

author = "Xingxing Liu and Ruonan Ji and Yi Zhang and Huafen Li and Wang, \{Shao Wei\}",

note = "Publisher Copyright: {\textcopyright} 2016, Springer Science+Business Media New York.",

year = "2016",

month = oct,

day = "1",

doi = "10.1007/s11082-016-0720-x",

language = "英语",

volume = "48",

journal = "Optical and Quantum Electronics",

issn = "0306-8919",

publisher = "Springer",

number = "10",

}

TY - JOUR

T1 - Annealing process and mechanism of glass based VO2 film from V oxidation in pure oxygen atmosphere

AU - Liu, Xingxing

AU - Ji, Ruonan

AU - Zhang, Yi

AU - Li, Huafen

AU - Wang, Shao Wei

PY - 2016/10/1

Y1 - 2016/10/1

N2 - Vanadium oxidation method is a promising approach for industrial production of VO2 thin film on glass. For this method, post-annealing process is vital to the formation and quality of VO2 thin film. Annealing temperature, time, and oxygen pressure for preparing of large scale VO2 films on glass were studied systematically in this work. The influence of V film thickness is studied as well. The results reveal that the best annealing parameters are significantly influenced by the thickness of V film. The mechanism of annealing oxidation process is discussed further. The oxidation process is dominated by the reaction-control rather than the diffusion-control. A 200 mm × 200 mm large area VO2 film on glass substrate was successfully prepared through metal vanadium oxidation method for demonstration. It is a promising way for large scale fabrication of high performance smart energy-saving window.

AB - Vanadium oxidation method is a promising approach for industrial production of VO2 thin film on glass. For this method, post-annealing process is vital to the formation and quality of VO2 thin film. Annealing temperature, time, and oxygen pressure for preparing of large scale VO2 films on glass were studied systematically in this work. The influence of V film thickness is studied as well. The results reveal that the best annealing parameters are significantly influenced by the thickness of V film. The mechanism of annealing oxidation process is discussed further. The oxidation process is dominated by the reaction-control rather than the diffusion-control. A 200 mm × 200 mm large area VO2 film on glass substrate was successfully prepared through metal vanadium oxidation method for demonstration. It is a promising way for large scale fabrication of high performance smart energy-saving window.

KW - Annealing

KW - Magnetron sputtering

KW - Transmission change

KW - VO film

UR - https://www.scopus.com/pages/publications/84986276591

U2 - 10.1007/s11082-016-0720-x

DO - 10.1007/s11082-016-0720-x

M3 - 文章

AN - SCOPUS:84986276591

SN - 0306-8919

VL - 48

JO - Optical and Quantum Electronics

JF - Optical and Quantum Electronics

IS - 10

M1 - 453

ER -

Annealing process and mechanism of glass based VO₂ film from V oxidation in pure oxygen atmosphere

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