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Anisotropic carrier transport properties in layered cobaltate epitaxial films grown by reactive solid-phase epitaxy

  • Kenji Sugiura*
  • , Hiromichi Ohta
  • , Shin Ichi Nakagawa
  • , Rong Huang
  • , Yuichi Ikuhara
  • , Kenji Nomura
  • , Hideo Hosono
  • , Kunihito Koumoto
  • *Corresponding author for this work
  • Nagoya University
  • Japan Fine Ceramics Center
  • The University of Tokyo
  • Institute of Science Tokyo
  • FCRC

Research output: Contribution to journalArticlepeer-review

Abstract

Herein we report the anisotropic carrier transport properties of a layered cobaltate, Nax CoO2 epitaxial film grown on the m -plane of an α -Al2 O3 substrate using reactive solid-phase epitaxy. Scanning and transmission electron microscopy analyses revealed that Nax CoO2 was heteroepitaxially grown with the CoO2 conducting planes inclined by ∼43° against the α -Al2 O3 substrate surface. The electrical resistivity parallel to the CoO2 planes was ∼1/5 of the perpendicular one, but the parallel Seebeck coefficient was about twice as large as the perpendicular one. Hence, a higher thermoelectric efficiency in the cobaltates can be obtained within the CoO2 planes.

Original languageEnglish
Article number152105
JournalApplied Physics Letters
Volume94
Issue number15
DOIs
StatePublished - 2009
Externally publishedYes

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