Analysis of nano-filament evolution in Ni-based RRAM devices using in-situ TEM

  • Chaolun Wang
  • , Xing Wu*
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Resistive switching materials with the potential of being a promising candidate for nonvolatile data storage and reconfiguration of electronic applications have been intensively studied. Here we present the mechanisms of highly repeatable resistive switching of Ni based random access memory device. In-situ transmission electron microscopy was used to study the real time evolution of the physical structure and the chemical composition of the nanofilament during resistive switching. Formation and breakdown of single/multiple nanofilaments was observed during the SET and RESET process, which results in an abrupt current change. Oxygen vacancies generated during soft breakdown become the metal atom migration path where forms and breaks the nanofilament under the voltage strike circulation.

Original languageEnglish
Title of host publication2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Proceedings
EditorsYu-Long Jiang, Ting-Ao Tang, Ru Huang
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages876-879
Number of pages4
ISBN (Electronic)9781467397179
DOIs
StatePublished - 2016
Event13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Hangzhou, China
Duration: 25 Oct 201628 Oct 2016

Publication series

Name2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Proceedings

Conference

Conference13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016
Country/TerritoryChina
CityHangzhou
Period25/10/1628/10/16

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