Ablation mechanism of fused silica under femtosecond laser pulse

Shizhen Xu*, Zhizhan Xu, Tianqin Jia, Haiyi Sun, Xiaoxi Li, Donghai Feng, Chengbin Li

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

Based on the avalanche model, the mechanism of femtosecond laser-induced ablation in fused silica was investigated. The three microscopic processes, including the production of conduction band electrons (CBE), the deposition of laser energy, and the diffusion of CBE and energy, were solved by a finite element method (FEM) of two-dimension cylinder coordinate. The conduction band electrons (CBE) were produced through photoionization and impact ionization, which were calculated via Keldysh theory and Double-flux model, respectively. The accumulated charge and the electrostatic field were also calculated, and the evolution of microexplosion was discussed based on this model. The results indicate that the CBE and energy diffusion plays an important role in the ablation of dielectrics by femtosecond laser pulse.

Original languageEnglish
Article number44
Pages (from-to)291-298
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5629
DOIs
StatePublished - 2005
Externally publishedYes
EventLasers in Material Processing and Manufacturing II - Beijing, China
Duration: 10 Nov 200412 Nov 2004

Keywords

  • Avalanche model
  • Femtosecond laser pulse
  • Finite element method
  • Laser ablation
  • Microexplosion

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