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Ablation induced by femtosecond laser in sapphire

  • Xiaoxi Li*
  • , Tianqin Jia
  • , Donghai Feng
  • , Zhizhan Xu
  • *Corresponding author for this work
  • CAS - Shanghai Institute of Optics and Fine Mechanics

Research output: Contribution to journalArticlepeer-review

Abstract

Based on the linearity of ablated area and laser pulse energy, the threshold fluence of sapphire is determined accurately in this paper. Meanwhile the dependences of F th on pulse duration (τ < 1 ps) with laser at 400 and 800nm are presented, respectively. It is found that the experiment results agree well with the theoretical calculations based on avalanche model. And we discuss the photon absorption mechanism of the conduction band electrons in Al 2 O 3 single crystal.

Original languageEnglish
Pages (from-to)339-346
Number of pages8
JournalApplied Surface Science
Volume225
Issue number1-4
DOIs
StatePublished - 30 Mar 2004
Externally publishedYes

Keywords

  • Ablation
  • Femtosecond laser
  • Sapphire

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