A stable porous silicon dielectric reflector with a photonic band gap centred at 10μm

  • Jie Zhang*
  • , Shao Hui Xu
  • , Shi Qian Yang
  • , Lian Wei Wang
  • , Zhi Shen Cao
  • , Peng Zhan
  • , Zhen Lin Wang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

By pulsed anodic etching at low temperature, we prepared a porous silicon reflector with a photonic band gap centred in the long-wavelength infrared spectral region (centred at about 12 μm). After proper oxidation process, the stable reflector structure, which can reflect electromagnetic wave from 8μm to 12μm (centred at 10μm) within wide incidence angles (about 50°), is obtained. The wavelength shift of absorption peak of Si-H and Si-O shows the influence of oxidation process and indicates the stability of oxidized porous silicon dielectric reflector, which offers possible applications for the room temperature infrared sensor.

Original languageEnglish
Pages (from-to)1317-1320
Number of pages4
JournalChinese Physics Letters
Volume25
Issue number4
DOIs
StatePublished - 1 Apr 2008

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