A HfS2-based photoelectronic synaptic transistor with tunable synaptic plasticity for emotional memory

  • Qiangfei Wang
  • , Ruiqi Jiang
  • , Zhaotan Gao
  • , Menghan Deng
  • , Junhui Chen
  • , Liangqing Zhu
  • , Liyan Shang
  • , Yawei Li
  • , Dirk Fuchs
  • , Jinzhong Zhang*
  • , Zhigao Hu
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

Neuromorphic computing has attracted great attention to mimic the human brain functions of perception, learning, and memory, which is considered to overcome the “von Neumann bottleneck”. Here, we developed a HfS2-based photoelectronic field effect transistor with a tunable synaptic plasticity. By modulating the gate voltages, the paired-pulse plasticity undergoes a transition between paired-pulse facilitation (PPF = 128%) and paired-pulse depression (PPD = 89%) due to the charge-trapping effect under a pulsed light (λ = 405 nm). In a further step, five emotion valences and emotion-related learning and memories are successfully mimicked based on the various artificial synaptic metaplasticity of the HfS2-based synaptic devices. This work provides an alternative approach to modulate the synaptic plasticity of artificial synaptic transistors for emotional memory and a new strategy to improve brain-like simulations of neuromorphic computing.

Original languageEnglish
Article number156148
JournalApplied Surface Science
Volume613
DOIs
StatePublished - 15 Mar 2023
Externally publishedYes

Keywords

  • Charge-trapping effect
  • Emotional memory
  • HfS-based photoelectronic transistors
  • Tunable synaptic plasticity

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