近阈值电压下可容错的末级缓存结构设计

Translated title of the contribution: Fault-tolerant Last Level Cache Architecture Design at Near-threshold Voltage
  • Wei Liu*
  • , Zhigang Wei
  • , Wei Du
  • , Guangyi Cao
  • , Wei Wang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Near-threshold voltage computing enables transistor voltage scaling to continue with Moore’s Law projection and dramatically improves power and energy efficiency. However, a great number of bit-cell errors occur in large SRAM structures, such as Last-Level Cache (LLC). A Fault-Tolerant LLC (FTLLC) design with conventional 6T SRAM cells is proposed to deal with a higher failure rate which is more than 1% at near-threshold voltage. FTLLC improves the reliability of data stored in Cache by correcting the single-error and compressing multi-errors in Cache entry. To validate the efficiency of FTLLC, FTLLC and prior works are implemented in gem5, and are simulated with SPEC CPU2006. The experiment shows that compared with Concertina at 650 mV, the performance of a 65 nm FTLLC with 4-Byte subblock size improves by 7.2% and the Cache capacity increases by 24.9%. Besides, the miss rate decreases by 58.2%, and there are little increases on area overhead and power consumption.

Translated title of the contributionFault-tolerant Last Level Cache Architecture Design at Near-threshold Voltage
Original languageChinese (Traditional)
Pages (from-to)1759-1766
Number of pages8
JournalDianzi Yu Xinxi Xuebao/Journal of Electronics and Information Technology
Volume40
Issue number7
DOIs
StatePublished - 1 Jul 2018
Externally publishedYes

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