基于 90 nm InP HEMT 工艺的 220 GHz 功率放大器设计

Translated title of the contribution: Design of 220 GHz power amplifier based on 90 nm InP HEMT process

Yan Chen, Fan Zhong Meng, Yuan Fang, Ao Zhang, Jian Jun Gao

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Based on the 90 nm InP HEMT process,a 220 GHz power amplifier terahertz integrated circuit design (TMIC)is designed. The amplifier adopts the on-chip Wilkinson power divider structure to realize the power synthesis of two-way five stage common-source amplifiers. The on-wafer measurement results show that the average small signal gain of the power amplifier is 18 dB. The power test results show that the saturated output power of the power amplifier is better than 15. 8 mW from 210 GHz to 230 GHz,with a maximum output power of 20. 9 mW at 223 GHz. The size of the TMIC chip is 2. 18 mm×2. 40 mm.

Translated title of the contributionDesign of 220 GHz power amplifier based on 90 nm InP HEMT process
Original languageChinese (Traditional)
Pages (from-to)1037-1041
Number of pages5
JournalHongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves
Volume41
Issue number6
DOIs
StatePublished - Dec 2022

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